Santillan, Julius Joseph
Harumoto, Masahiko
Motono, Tomohiro
dos Santos, Andreia Figueiredo
Mori, Chisayo
Tanaka, Yuji
Stokes, Harold
Asai, Masaya
Itani, Toshiro
Article Title: Application of ethyltrimethylammonium hydroxide (ETMAH) as an alternative developer solution/process for semiconductor lithography
Journal Title: Japanese Journal of Applied Physics
Article Type: paper
Copyright Information: © 2021 The Japan Society of Applied Physics
Publication dates
Date Received: 2020-11-30
Date Accepted: 2021-02-03
Online publication date: 2021-02-22