Azumagawa, Kazuki https://orcid.org/0000-0002-1892-9964
Kozawa, Takahiro https://orcid.org/0000-0002-0124-5240
Article Title: Application of machine learning to stochastic effect analysis of chemically amplified resists used for extreme ultraviolet lithography
Journal Title: Japanese Journal of Applied Physics
Article Type: paper
Copyright Information: © 2021 The Japan Society of Applied Physics
Publication dates
Date Received: 2020-11-30
Date Accepted: 2021-02-19
Online publication date: 2021-03-08