Isomura, Noritake
Soejima, Narumasa
Mori, Tomohiko
Ikeda, Satoshi
Watanabe, Atsushi
Okawa, Takashi
Tomita, Hidemoto
Article Title: Dependence of the interfacial atomic structure of SiO 2 /GaN upon SiO 2 deposition methods and post-deposition annealing, as revealed by X-ray absorption spectroscopy
Journal Title: Japanese Journal of Applied Physics
Article Type: paper
Copyright Information: © 2021 The Japan Society of Applied Physics. All rights, including for text and data mining, AI training, and similar technologies, are reserved.
Publication dates
Date Received: 2021-03-29
Date Accepted: 2021-04-11
Online publication date: 2021-04-23