Koyama, Masanori
Imai, Kyohei
Shirai, Masamitsu
Hirai, Yoshihiko
Yasuda, Masaaki
Article Title: Effects of acid diffusion and resist molecular size on line edge roughness for chemically amplified resists in EUV lithography: computational study
Journal Title: Japanese Journal of Applied Physics
Article Type: paper
Copyright Information: © 2021 The Japan Society of Applied Physics. All rights, including for text and data mining, AI training, and similar technologies, are reserved.
Publication dates
Date Received: 2021-02-04
Date Accepted: 2021-09-15
Online publication date: 2021-10-07