Bae, Hansin https://orcid.org/0000-0003-3276-8471
Hamaguchi, Ikumi
Sasai, Kensuke
Suzuki, Haruka https://orcid.org/0000-0002-6877-6417
Toyoda, Hirotaka https://orcid.org/0000-0003-2914-4852
Article Title: Enhancement of the ion flux to the substrate through high-voltage biasing in an electron cyclotron resonance plasma and its application to high-speed deposition of conductive carbon film
Journal Title: Japanese Journal of Applied Physics
Article Type: paper
Copyright Information: © 2021 The Japan Society of Applied Physics
Publication dates
Date Received: 2021-08-09
Date Accepted: 2021-10-21
Online publication date: 2021-12-02