Kozawa, Takahiro https://orcid.org/0000-0002-0124-5240
Tamura, Takao
Article Title: Relationship between blurring factors and interfacial effects in chemically amplified resist processes in photomask fabrication
Journal Title: Japanese Journal of Applied Physics
Article Type: paper
Copyright Information: © 2021 The Japan Society of Applied Physics
Publication dates
Date Received: 2021-08-20
Date Accepted: 2021-10-26
Online publication date: 2021-12-02