Seki, Hironori
Kawamura, Keiya
Hayashi, Hidetaka
Ishii, Yasuyuki
Puttaraksa, Nitipon
Nishikawa, Hiroyuki
Article Title: Utilizing a photosensitive dry film resist in proton beam writing
Journal Title: Japanese Journal of Applied Physics
Article Type: paper
Copyright Information: © 2022 The Japan Society of Applied Physics
Publication dates
Date Received: 2021-11-29
Date Accepted: 2022-02-15
Online publication date: 2022-03-24