Hirata, Akiko https://orcid.org/0000-0003-4628-2405
Fukasawa, Masanaga https://orcid.org/0000-0002-9011-8293
Tercero, Jomar U.
Kugimiya, Katsuhisa
Hagimoto, Yoshiya
Karahashi, Kazuhiro
Hamaguchi, Satoshi https://orcid.org/0000-0001-6580-8797
Iwamoto, Hayato
Article Title: Five-step plasma-enhanced atomic layer etching of silicon nitride with a stable etched amount per cycle
Journal Title: Japanese Journal of Applied Physics
Article Type: paper
Copyright Information: © 2022 The Japan Society of Applied Physics. All rights, including for text and data mining, AI training, and similar technologies, are reserved.
Publication dates
Date Received: 2021-12-12
Date Accepted: 2022-03-29
Online publication date: 2022-05-23