Kumakura, Sho
Sasagawa, Hironari
Nishizuka, Tetsuya
Kihara, Yoshihide
Honda, Masanobu
Article Title: Novel technology of high-aspect-ratio etch utilizing coverage-controllable atomic layer deposition
Journal Title: Japanese Journal of Applied Physics
Article Type: paper
Copyright Information: © 2022 The Author(s). Published on behalf of The Japan Society of Applied Physics by IOP Publishing Ltd
Publication dates
Date Received: 2021-12-24
Date Accepted: 2022-04-05
Online publication date: 2022-06-21