Takahashi, Tsuyoshi https://orcid.org/0000-0002-6656-0663
Kouma, Norinao
Doi, Yoshiyasu https://orcid.org/0000-0003-2883-6670
Sato, Shintaro https://orcid.org/0000-0002-7249-5570
Tamate, Shuhei https://orcid.org/0000-0002-4033-8984
Nakamura, Yasunobu https://orcid.org/0000-0003-0424-630X
Article Title: Uniformity improvement of Josephson-junction resistance by considering sidewall deposition during shadow evaporation for large-scale integration of qubits
Journal Title: Japanese Journal of Applied Physics
Article Type: paper
Copyright Information: © 2022 The Japan Society of Applied Physics. All rights, including for text and data mining, AI training, and similar technologies, are reserved.
Publication dates
Date Received: 2022-10-20
Date Accepted: 2022-11-13
Online publication date: 2022-12-02