Fukui, Takuya
Ishii, Tatsuya
Tawara, Takeshi
Takenaka, Kensuke
Kato, Masashi https://orcid.org/0000-0002-2921-709X
Article Title: Effects of ion implantation process on defect distribution in SiC SJ-MOSFET
Journal Title: Japanese Journal of Applied Physics
Article Type: paper
Copyright Information: © 2023 The Japan Society of Applied Physics. All rights, including for text and data mining, AI training, and similar technologies, are reserved.
Publication dates
Date Received: 2022-10-17
Date Accepted: 2023-01-04
Online publication date: 2023-01-25