Bian, Chunxu
Zhang, Xiaodong
Tang, Wenbo https://orcid.org/0000-0002-6700-1636
Zhang, Li
Ma, Yongjian
Chen, Tiwei
Zhou, Xin
Li, Botong
Tang, Jilong https://orcid.org/0000-0002-6700-1636
Zeng, Zhongming
Zhang, Baoshun
Funding for this research was provided by:
Natural Science Foundation Key Project of Jiangxi Province (20202ACBL202001)
Jiangxi Province Double Thousand Plan (S2019CQKJ2638)
National Basic Research Program of China (2021YFB3600202)
Key Laboratory Construction Project of Nanchang (2020-NCZDSY-008)
Article Title: Effect of RF power and gas ratio on the sidewall of β-Ga2O3 films via inductively coupled plasma etching
Journal Title: Japanese Journal of Applied Physics
Article Type: paper
Copyright Information: © 2023 The Japan Society of Applied Physics
Publication dates
Date Received: 2022-11-24
Date Accepted: 2023-01-16
Online publication date: 2023-02-06