Harumoto, Masahiko
dos Santos, Andreia Figueiredo
Santillan, Julius Joseph
Itani, Toshiro
Kozawa, Takahiro https://orcid.org/0000-0002-0124-5240
Article Title: Photoresist stochastic defect generation depending on alkyl chain length and concentration of tetraalkylammonium hydroxide in alkali aqueous developer
Journal Title: Japanese Journal of Applied Physics
Article Type: paper
Copyright Information: © 2023 The Japan Society of Applied Physics. All rights, including for text and data mining, AI training, and similar technologies, are reserved.
Publication dates
Date Received: 2022-12-13
Date Accepted: 2023-02-17
Online publication date: 2023-03-23