Hada, Miyako
Takahashi, Motonobu
Sakaguchi, Yuhei
Fujii, Tetsuo
Minami, Masakazu
Article Title: Chamber in-situ estimation during etching process by SiF4 monitoring using laser absorption spectroscopy
Journal Title: Japanese Journal of Applied Physics
Article Type: paper
Copyright Information: © 2023 The Author(s). Published on behalf of The Japan Society of Applied Physics by IOP Publishing Ltd.
Publication dates
Date Received: 2022-12-07
Date Accepted: 2023-04-12
Online publication date: 2023-05-24