Le, Dan N.
Park, Taehee
Hwang, Su Min
Kim, Jin-Hyun
Jung, Yong Chan
Tiwale, Nikhil
Subramanian, Ashwanth
Lee, Won-Il
Choi, Rino
Sung, Myung M.
Nam, Chang-Yong
Kim, Jiyoung
Article Title: Atomic layer deposition and its derivatives for extreme ultraviolet (EUV) photoresist applications
Journal Title: Japanese Journal of Applied Physics
Article Type: paper
Copyright Information: © 2023 The Author(s). Published on behalf of The Japan Society of Applied Physics by IOP Publishing Ltd
Publication dates
Date Received: 2022-12-21
Date Accepted: 2023-04-19
Online publication date: 2023-06-08