Imai, Masaya https://orcid.org/0000-0002-3403-1775
Matsui, Miyako
Sugano, Ryoko
Shiota, Takashi
Takasaki, Ko-ichi
Miura, Makoto
Ishii, Yohei
Kuwahara, Kenichi
Article Title: Activation mechanism of ruthenium etching by Cl-based radicals in O2/Cl2 plasma
Journal Title: Japanese Journal of Applied Physics
Article Type: paper
Copyright Information: © 2023 The Japan Society of Applied Physics. All rights, including for text and data mining, AI training, and similar technologies, are reserved.
Publication dates
Date Received: 2022-12-23
Date Accepted: 2023-04-19
Online publication date: 2023-05-25