Morimoto, Michikazu https://orcid.org/0000-0003-0565-7733
Matsui, Miyako
Ikeda, Norihiko
Koga, Kazunori https://orcid.org/0000-0002-9214-7493
Shiratani, Masaharu https://orcid.org/0000-0002-4103-3939
Article Title: Highly selective Si3N4 etching on Si using pulsed-microwave CH3F/O2/Ar plasma
Journal Title: Japanese Journal of Applied Physics
Article Type: paper
Copyright Information: © 2023 The Japan Society of Applied Physics. All rights, including for text and data mining, AI training, and similar technologies, are reserved.
Publication dates
Date Received: 2023-04-22
Date Accepted: 2023-06-21
Online publication date: 2023-07-21