Thi Cam Tu, Huynh https://orcid.org/0000-0001-6385-081X
Ohdaira, Keisuke https://orcid.org/0000-0003-0667-4922
Article Title: Long-term stability of low-temperature deposited Cat-CVD SiN x thin film against damp-heat stress
Journal Title: Japanese Journal of Applied Physics
Article Type: paper
Copyright Information: © 2023 The Japan Society of Applied Physics. All rights, including for text and data mining, AI training, and similar technologies, are reserved.
Publication dates
Date Received: 2023-07-26
Date Accepted: 2023-09-26
Online publication date: 2023-12-21