Okada, Naoya https://orcid.org/0000-0002-0512-8324
Uchida, Noriyuki https://orcid.org/0000-0001-6356-2041
Kanayama, Toshihiko https://orcid.org/0000-0001-8611-7186
Article Title: Fermi-level depinning in Mo/Si junctions by insertion of amorphous Si-rich Mo silicide film formed via gas-phase reactions of MoF6 with SiH4
Journal Title: Japanese Journal of Applied Physics
Article Type: paper
Copyright Information: © 2024 The Japan Society of Applied Physics. All rights, including for text and data mining, AI training, and similar technologies, are reserved.
Publication dates
Date Received: 2023-10-12
Date Accepted: 2023-11-13
Online publication date: 2024-01-04