Ali, Mehdi https://orcid.org/0000-0002-5203-3125
Yamashita, Daiki https://orcid.org/0009-0003-4638-8231
Isshiki, Hideo https://orcid.org/0000-0003-0009-7941
Article Title: Growth of CuAlO2 on SiO2 under a layer-by-layer approach conducted by digitally processed DC sputtering and its transistor characteristics
Journal Title: Japanese Journal of Applied Physics
Article Type: paper
Copyright Information: © 2024 The Author(s). Published on behalf of The Japan Society of Applied Physics by IOP Publishing Ltd
Publication dates
Date Received: 2023-12-15
Date Accepted: 2024-02-18
Online publication date: 2024-03-12