Yamamoto, Kaichi https://orcid.org/0009-0000-7211-3934
Utsunomiya, Toru https://orcid.org/0000-0002-0023-7812
Ichii, Takashi https://orcid.org/0000-0002-4021-8894
Sugimura, Hiroyuki
Article Title: MoS2-assisted chemical etching of silicon in an HF/H2O vapor
Journal Title: Japanese Journal of Applied Physics
Article Type: paper
Copyright Information: © 2024 The Japan Society of Applied Physics. All rights, including for text and data mining, AI training, and similar technologies, are reserved.
Publication dates
Date Received: 2023-12-12
Date Accepted: 2024-03-04
Online publication date: 2024-04-02