Huang, Shengzhou https://orcid.org/0000-0002-3184-325X
Tang, Yuanzhuo
Ren, Bowen
Wu, Dongjie
Pan, Jiani
Tian, Zhaowei
Jiang, Chengwei
Li, Zhi
Huang, Jinjin
Funding for this research was provided by:
Anhui Province college young and middle-aged teachers training action project (JNFX2023015)
Key Research and development program of Anhui Province (2022a05020008)
National Natural Science Foundation of China (62305001)
Natural Science Foundation of Anhui Province (2308085MF210)
China Postdoctoral Science Foundation (2022M710175)
Major Project of Natural Science Study in Universities of Anhui Province (2022AH040138)
Research activities of postdoctoral researchers in Anhui Province (2023B707)
Open Project of Special Display and Imaging Technology Innovation Center of Anhui Province (2022AJ05002)
Anhui Polytechnic University Graduate Education Innovation Fund and the New Era Education Quality Project (Postgraduate Education).
Article Title: DMD maskless lithography optimization based on an improved genetic algorithm
Journal Title: Japanese Journal of Applied Physics
Article Type: paper
Copyright Information: © 2024 The Japan Society of Applied Physics. All rights, including for text and data mining, AI training, and similar technologies, are reserved.
Publication dates
Date Received: 2024-01-17
Date Accepted: 2024-03-10
Online publication date: 2024-04-08