Philipsen, Vicky https://orcid.org/0000-0002-2959-432X
Frommhold, Andreas https://orcid.org/0000-0001-6824-5643
Thakare, Devesh https://orcid.org/0000-0003-3265-7042
Libeert, Guillaume https://orcid.org/0000-0003-1392-5371
Lee, Inhwan https://orcid.org/0000-0002-3283-5075
Franke, Joern-Holger https://orcid.org/0000-0002-3571-1633
Bekaert, Joost https://orcid.org/0000-0003-3075-3479
Van Look, Lieve https://orcid.org/0009-0000-6198-024X
Pellens, Nick https://orcid.org/0000-0001-5527-5130
De Bisschop, Peter https://orcid.org/0000-0002-8297-5076
Jonckheere, Rik https://orcid.org/0000-0003-2211-9443
Kovalevich, Tatiana https://orcid.org/0000-0001-9633-8257
Wiaux, Vincent https://orcid.org/0000-0002-8923-5708
Hendrickx, Eric https://orcid.org/0000-0003-2516-0417
Article Title: Mask innovations on the eve of high NA EUV lithography
Journal Title: Japanese Journal of Applied Physics
Article Type: paper
Copyright Information: © 2024 The Japan Society of Applied Physics. All rights, including for text and data mining, AI training, and similar technologies, are reserved.
Publication dates
Date Received: 2024-01-15
Date Accepted: 2024-03-27
Online publication date: 2024-04-18