Hattori, T. https://orcid.org/0000-0001-6674-4887
Kobayashi, H.
Ohtake, H.
Akinaga, K.
Kurosaki, Y.
Takei, A.
Sekiguchi, A.
Maeda, K.
Takubo, C.
Yamada, M.
Article Title: Etching selectivity of SiO2 to SiN using HF and methanol at higher pressures up to 900 Pa
Journal Title: Japanese Journal of Applied Physics
Article Type: paper
Copyright Information: © 2024 The Japan Society of Applied Physics. All rights, including for text and data mining, AI training, and similar technologies, are reserved.
Publication dates
Date Received: 2024-01-31
Date Accepted: 2024-04-16
Online publication date: 2024-06-07