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Review and perspective of dry etching and deposition process modeling of Si and Si dielectric films for advanced CMOS device applications

Published Online: 2024-08-06

Published Print: 2024-08-01

Authors

Kuboi, Nobuyuki
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Text and Data Mining valid from 2024-08-06
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Article Title: Review and perspective of dry etching and deposition process modeling of Si and Si dielectric films for advanced CMOS device applications

Journal Title: Japanese Journal of Applied Physics

Article Type: paper

Copyright Information: © 2024 The Author(s). Published on behalf of The Japan Society of Applied Physics by IOP Publishing Ltd

Publication dates

Date Received: 2024-03-19

Date Accepted: 2024-06-02

Online publication date: 2024-08-06

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