Imai, Shinya https://orcid.org/0000-0002-1993-9910
Tatsumi, Tetsuya
Tomiya, Shigetaka
Kakushima, Kuniyuki
Wakabayashi, Hitoshi
Funding for this research was provided by:
MEXT Initiative to Establish Next-generation Novel Integrated Circuits Centers (JPJ011438)
JSPS KAKENHI (20H05880)
Article Title: Improvement of MoS2 film quality using sputtering processes controlling particle- and energy-flux followed by sulfur-vapor annealing
Journal Title: Japanese Journal of Applied Physics
Article Type: paper
Copyright Information: © 2025 The Author(s). Published on behalf of The Japan Society of Applied Physics by IOP Publishing Ltd
Publication dates
Date Received: 2024-10-28
Date Accepted: 2025-01-08
Online publication date: 2025-02-03