Seo, Myeong Seok
Park, Hyun Keun
Shin, Jong Hyeon
Hong, Sang Jeen https://orcid.org/0000-0002-6576-690X
Article Title: Effects of mid-frequency power on SiO2 etching profile for fluorocarbon gas mixture in 100 MHz, 13.56 MHz, and 2 MHz triple-frequency capacitively coupled plasma
Journal Title: Japanese Journal of Applied Physics
Article Type: paper
Copyright Information: © 2025 The Japan Society of Applied Physics. All rights, including for text and data mining, AI training, and similar technologies, are reserved.
Publication dates
Date Received: 2025-01-22
Date Accepted: 2025-03-18
Online publication date: 2025-04-07