Ogawa, Kenta
Chikyow, Toyohiro https://orcid.org/0000-0003-3860-4806
Daimon, Yuki
Ogura, Atsushi https://orcid.org/0000-0003-2008-7695
Nagata, Takahiro https://orcid.org/0000-0002-8591-2943
Article Title: Effects of interface formation process on electronic properties of n-type Ti0.3Zn0.7O1.3/p-type Si stack structure
Journal Title: Japanese Journal of Applied Physics
Article Type: paper
Copyright Information: © 2025 The Japan Society of Applied Physics. All rights, including for text and data mining, AI training, and similar technologies, are reserved.
Publication dates
Date Received: 2024-12-12
Date Accepted: 2025-04-25
Online publication date: 2025-05-19