Fukasawa, Masanaga
Irisawa, Toshifumi
Ota, Hiroyuki
Hayashi, Yoshihiro
Masahara, Meishoku
Article Title: High selective atomic layer etching in combination with area-selective deposition for atomic-scale process design
Journal Title: Japanese Journal of Applied Physics
Article Type: paper
Copyright Information: © 2025 The Author(s). Published on behalf of The Japan Society of Applied Physics by IOP Publishing Ltd
Publication dates
Date Received: 2025-03-14
Date Accepted: 2025-05-27
Online publication date: 2025-06-17