Sun, Kuangda
Selvaraj, Suganthamalar
Hazumi, Masahiro
Hsiao, Shih-Nan https://orcid.org/0000-0001-6361-4075
Sekine, Makoto
Abe, Chihiro
Sasaki, Toshiyuki
Hayashi, Hisataka
Ishikawa, Kenji https://orcid.org/0000-0002-8288-6620
Hori, Masaru
Article Title: Cycle etching of SiO 2 film using Ar plasma irradiation of CHF 3 -condensed layer at cryogenic temperature below −120 °C
Journal Title: Japanese Journal of Applied Physics
Article Type: paper
Copyright Information: © 2025 The Author(s). Published on behalf of The Japan Society of Applied Physics by IOP Publishing Ltd
Publication dates
Date Received: 2025-05-16
Date Accepted: 2025-11-21
Online publication date: 2025-12-22