Seo, Myeong Seok
Shin, Jong-Hyeon
Park, Jong-Bae
Hong, Sang Jeen https://orcid.org/0000-0002-6576-690X
Article Title: Etch characteristics of SiO 2 for fluorocarbon gas mixture in triple-frequency capacitively coupled plasma
Journal Title: Japanese Journal of Applied Physics
Article Type: paper
Copyright Information: © 2026 The Japan Society of Applied Physics. All rights, including for text and data mining, AI training, and similar technologies, are reserved.
Publication dates
Date Received: 2025-12-07
Date Accepted: 2026-02-10
Online publication date: 2026-02-27