Santillan, Julius Joseph
Fukasawa, Masanaga
Itani, Toshiro
Mizubayashi, Wataru
Article Title: The effect of atomic layer etching (ALE) processes on polyhydroxystyrene-based EUV chemical amplification resist
Journal Title: Japanese Journal of Applied Physics
Article Type: paper
Copyright Information: © 2026 The Japan Society of Applied Physics. All rights, including for text and data mining, AI training, and similar technologies, are reserved.
Publication dates
Date Received: 2025-12-19
Date Accepted: 2026-02-10
Online publication date: 2026-02-26