Ishikawa, Kenji https://orcid.org/0000-0002-8288-6620
Nguyen, Thi-Thuy-Nga https://orcid.org/0000-0002-2170-2488
Inoue, Kenichi https://orcid.org/0000-0001-5553-944X
Osonio, Airah P https://orcid.org/0000-0002-6383-9669
Nguyen, Tran Trung
Tsutsumi, Takayoshi https://orcid.org/0000-0001-5429-1606
Li, Lan https://orcid.org/0000-0003-3870-8437
Shinoda, Kazunori
Song, Mi-Young
Choi, Yong Sup https://orcid.org/0000-0002-1893-4675
Kaganovich, Igor https://orcid.org/0000-0003-0653-5682
Raitses, Yevgeny https://orcid.org/0000-0002-9382-9963
Article Title: Recent progress in atomic-scale controlled plasma processing
Journal Title: Japanese Journal of Applied Physics
Article Type: paper
Copyright Information: © 2026 The Author(s). Published on behalf of The Japan Society of Applied Physics by IOP Publishing Ltd
Publication dates
Date Received: 2025-12-25
Date Accepted: 2026-04-27
Online publication date: 2026-06-19