Ozaki, Shiro
Kumazaki, Yusuke
Okamoto, Naoya
Hara, Naoki
Ohki, Toshihiro
Article Title: Improved f T/f max in wide bias range by steam-annealed ultrathin-Al2O3 gate dielectrics for InP-based high-electron-mobility transistors
Journal Title: Applied Physics Express
Article Type: paper
Copyright Information: © 2022 The Japan Society of Applied Physics
Publication dates
Date Received: 2022-02-01
Date Accepted: 2022-03-02
Online publication date: 2022-03-11