Huang, Shengzhou https://orcid.org/0000-0002-3184-325X
Jiang, Chengwei
Xie, Fanglin
Sun, Jiale
Li, Mujun
Gao, Qingzhen
Funding for this research was provided by:
Key Project of Natural Science Research of Anhui Province (KJ2019A0156)
Additive Manufacturing Institute, Anhui Polytechnic University (2020ybxm08)
Key Research and development program of Anhui Province (2022a05020008)
Scientific Research Foundation for the Introduction of Talent of Anhui Polytechnic University (2018YQQ027)
Chinese National Natural Science Foundation (51475442)
Young and middle-aged top talent project of Anhui Polytechnic University
Natural Science Foundation of Anhui Province (2008085QE258)
Article Title: An efficient and low-cost compensation method for exposure uniformity based on digital oblique scanning lithography
Journal Title: Applied Physics Express
Article Type: paper
Copyright Information: © 2022 The Japan Society of Applied Physics
Publication dates
Date Received: 2022-05-14
Date Accepted: 2022-06-16
Online publication date: 2022-06-27