Mizutani, Kazuto
Hoshii, Takuya https://orcid.org/0000-0002-2873-8715
Wakabayashi, Hitoshi
Tsutsui, Kazuo
Chang, Edward Y.
Kakushima, Kuniyuki
Funding for this research was provided by:
MEXT Initiative to Establish Next-generation Novel Integrated Circuits Centers (JPJ011438)
Center of Innovation Program (JPMJCE1309)
Ministry of Education in Taiwan (MOST 109-2634-F-009-029)
Article Title: Robust formation of ferroelectric HfO2 films by Y2O3 sub-monolayer lamination
Journal Title: Applied Physics Express
Article Type: paper
Copyright Information: © 2022 The Japan Society of Applied Physics
Publication dates
Date Received: 2022-09-07
Date Accepted: 2022-10-23
Online publication date: 2022-11-09