Nunomura, Shota https://orcid.org/0000-0002-6746-2619
Ota, Hiroyuki https://orcid.org/0000-0002-1634-3361
Irisawa, Toshifumi https://orcid.org/0000-0002-8801-7688
Endo, Kazuhiko https://orcid.org/0000-0002-3517-3580
Morita, Yukinori https://orcid.org/0000-0002-2666-6762
Funding for this research was provided by:
Japan Society for the Promotion of Science (23K03374)
Article Title: Defect generation and recovery in high-k HfO2/SiO2/Si stack fabrication
Journal Title: Applied Physics Express
Article Type: paper
Copyright Information: © 2023 The Author(s). Published on behalf of The Japan Society of Applied Physics by IOP Publishing Ltd
Publication dates
Date Received: 2023-05-15
Date Accepted: 2023-06-06
Online publication date: 2023-06-20