Funding for this research was provided by:
Basic and Applied Basic Research Foundation of Guangdong Province (2022A1515110159)
National Natural Science Foundation of China (62005097)
Article Title: Tunable reflection coating to reduce exposure power threshold for interference-assisted two-photon polymerization lithography
Journal Title: Applied Physics Express
Article Type: paper
Copyright Information: © 2023 The Japan Society of Applied Physics
Publication dates
Date Received: 2023-07-27
Date Accepted: 2023-08-21
Online publication date: 2023-09-12