Fujimoto, Hiroki https://orcid.org/0000-0002-8443-6279
Kobayashi, Takuma https://orcid.org/0000-0002-2755-5079
Watanabe, Heiji https://orcid.org/0000-0002-7916-3093
Funding for this research was provided by:
Ministry of Education, Culture, Sports, Science and Technology (JPJ009777)
Japan Society for the Promotion of Science (24H00046)
Article Title: Impact of post-deposition annealing on SiO2/SiC interfaces formed by plasma nitridation of the SiC surface and SiO2 deposition
Journal Title: Applied Physics Express
Article Type: paper
Copyright Information: © 2024 The Author(s). Published on behalf of The Japan Society of Applied Physics by IOP Publishing Ltd
Publication dates
Date Received: 2024-10-09
Date Accepted: 2024-11-11
Online publication date: 2024-11-26