Matsumoto, Kyohei https://orcid.org/0009-0006-3734-3842
Kato, Hibiki
Yu, Jiawen https://orcid.org/0009-0004-9050-8103
Hanafusa, Hiroaki https://orcid.org/0000-0002-4641-4968
Higashi, Seiichiro
Funding for this research was provided by:
Adaptable and Seamless Technology Transfer Program through Target-Driven R and D (JPMJTR20RS)
Japan Science and Technology Corporation (JPMJST2283)
Article Title: Ultra-fast etching of photoresist by reactive atmospheric-pressure thermal plasma jet with surface temperature measurement
Journal Title: Applied Physics Express
Article Type: paper
Copyright Information: © 2025 The Author(s). Published on behalf of The Japan Society of Applied Physics by IOP Publishing Ltd
Publication dates
Date Received: 2024-11-01
Date Accepted: 2024-12-25
Online publication date: 2025-01-17