Eissa, Moataz http://orcid.org/0000-0002-4339-2724
Mitarai, Takuya
Amemiya, Tomohiro
Miyamoto, Yasuyuki http://orcid.org/0000-0002-2676-7264
Nishiyama, Nobuhiko http://orcid.org/0000-0001-8288-6690
Funding for this research was provided by:
Accelerated Innovation Research Initiative Turning Top Science and Ideas into High-Impact Values (JPMJAC1603)
New Energy and Industrial Technology Development Organization
Core Research for Evolutional Science and Technology (JPMJCR15N16)
Japan Society for the Promotion of Science (#16H06082)
Article Title: Fabrication of Si photonic waveguides by electron beam lithography using improved proximity effect correction
Journal Title: Japanese Journal of Applied Physics
Article Type: paper
Copyright Information: © 2020 The Japan Society of Applied Physics
Publication dates
Date Received: 2020-07-08
Date Accepted: 2020-11-03
Online publication date: 2020-11-20