Nakamura, Norio http://orcid.org/0000-0002-6788-5224
Kato, Ryukou http://orcid.org/0000-0003-1141-0016
Sakai, Hiroshi http://orcid.org/0000-0002-5382-9379
Tsuchiya, Kimichika http://orcid.org/0000-0001-6776-0328
Tanimoto, Yasunori http://orcid.org/0000-0002-4673-972X
Honda, Yosuke http://orcid.org/0000-0003-2129-5971
Miyajima, Tsukasa http://orcid.org/0000-0002-6875-391X
Shimada, Miho http://orcid.org/0000-0002-5543-7192
Tanikawa, Takanori http://orcid.org/0000-0001-6268-2543
Tanaka, Olga A. http://orcid.org/0000-0003-3024-8616
Obina, Takashi http://orcid.org/0000-0002-4230-6046
Kawata, Hiroshi http://orcid.org/0000-0002-2988-8862
Article Title: High-power EUV free-electron laser for future lithography
Journal Title: Japanese Journal of Applied Physics
Article Type: paper
Copyright Information: © 2023 The Japan Society of Applied Physics
Publication dates
Date Received: 2022-11-30
Date Accepted: 2023-03-06
Online publication date: 2023-04-19