Article Title: Ferroelectric HfO 2 formation by annealing of a HfO 2 /Hf/HfO 2 /Si(100) stacked structure
Journal Title: Japanese Journal of Applied Physics
Article Type: paper
Copyright Information: © 2019 The Japan Society of Applied Physics. All rights, including for text and data mining, AI training, and similar technologies, are reserved.
Publication dates
Date Received: 2018-10-02
Date Accepted: 2019-01-06
Online publication date: 2019-02-25