Koyama, Masanori
Shirai, Masamitsu
Kawata, Hiroaki
Hirai, Yoshihiko
Yasuda, Masaaki
Journal title: Japanese Journal of Applied Physics
Article type: paper
Article title: Stochastic simulation of pattern formation for chemically amplified resist in electron beam lithography
Copyright information: © 2019 The Japan Society of Applied Physics
Publication dates
Date received: 2018-12-22
Date accepted: 2019-02-14
Online publication date: 2019-05-06