Yuli, Wen
Ohdaira, Keisuke
Article Title: Thickness dependence of the passivation quality of Cat-CVD SiN x films
Journal Title: Japanese Journal of Applied Physics
Article Type: paper
Copyright Information: © 2019 The Japan Society of Applied Physics. All rights, including for text and data mining, AI training, and similar technologies, are reserved.
Publication dates
Date Received: 2019-06-28
Date Accepted: 2019-10-03
Online publication date: 2019-12-04