Nunomura, Shota
Sakata, Isao
Matsubara, Koji
Funding for this research was provided by:
Japan Society for the Promotion of Science (15K04717)
Japan Society for the Promotion of Science (18K03603)
NEDO
Journal title: Applied Physics Express
Article type: lett
Article title: In-situ detection of interface defects in a-Si:H/c-Si heterojunction during plasma processing
Copyright information: © 2019 The Japan Society of Applied Physics
Publication dates
Date received: 2019-02-17
Date accepted: 2019-03-22
Online publication date: 2019-04-09