Shinoda, Nao
Itokawa, Hiroshi
Fujitsuka, Ryota
Sekine, Katsuyuki
Onoue, Seiji
Tonotani, Junichi
Article Title: Behavior of incorporated nitrogen in plasma-nitrided silicon oxide formed by chemical vapor deposition
Journal Title: Japanese Journal of Applied Physics
Article Type: paper
Copyright Information: © 2016 The Japan Society of Applied Physics
Publication dates
Date Received: 2015-09-25
Date Accepted: 2016-01-20
Online publication date: 2016-03-23