Ito, Shunya
Sato, Hiroki
Tasaki, Yuhei
Watanuki, Kimihito
Nemoto, Nobukatsu
Nakagawa, Masaru
Article Title: Durability to oxygen reactive ion etching enhanced by addition of synthesized bis(trimethylsilyl)phenyl-containing (meth)acrylates in ultraviolet nanoimprint lithography
Journal Title: Japanese Journal of Applied Physics
Article Type: paper
Copyright Information: © 2016 The Japan Society of Applied Physics
Publication dates
Date Received: 2015-11-26
Date Accepted: 2016-02-03
Online publication date: 2016-05-18