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Retraction: “Depth Profile Characterization of Spin-Coated Poly(3,4-ethylenedioxythiophene):Poly(styrene sulfonic acid) Films for Thin-Film Solar Cells during Argon Plasma Etching by Spectroscopic Ellipsometry”

Crossref DOI link: https://doi.org/10.7567/JJAP.55.089201

Published Online: 2016-07-19

Published Print: 2016-08-01

Update policy: https://doi.org/10.1088/crossmark-policy

Authors

Ino, Tomohisa

Hayashi, Tatsuya

Ueno, Keiji

Shirai, Hajime
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Article Title: Retraction: “Depth Profile Characterization of Spin-Coated Poly(3,4-ethylenedioxythiophene):Poly(styrene sulfonic acid) Films for Thin-Film Solar Cells during Argon Plasma Etching by Spectroscopic Ellipsometry”

Journal Title: Japanese Journal of Applied Physics

Article Type: paper

Copyright Information: © 2016 The Japan Society of Applied Physics

Publication dates

Date Received: 2016-03-17

Date Accepted: 2016-06-11

Online publication date: 2016-07-19

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