Kozawa, Takahiro
Santillan, Julius Joseph
Itani, Toshiro
Article Title: Analysis of line-and-space resist patterns with sub-20 nm half-pitch fabricated using high-numerical-aperture exposure tool of extreme ultraviolet lithography
Journal Title: Japanese Journal of Applied Physics
Article Type: paper
Copyright Information: © 2016 The Japan Society of Applied Physics
Publication dates
Date Received: 2016-05-09
Date Accepted: 2016-06-20
Online publication date: 2016-08-04